Abstract:With the accelerated replacement of electronic products, the demand for performance has also increased, and this trend has significantly promoted the development of electronic products in the direction of miniaturization and high performance. However, miniaturization and high performance are often accompanied by a sharp increase in the heat flux, bringing unprecedented challenges to thermal design. In practice, if the heat flux generated by electronic products cannot be dissipated in time, it will not only lead to a significant decline in its performance, but in extreme cases may also lead to equipment damage. Therefore, efficient heat-dissipation technology has become a key bottleneck for the sustainable development of electronic products. In recent years, the application of vapor chamber technology has become an important way to solve the problem of efficient heat dissipation in miniaturized electronic products. The purpose of this study is to analyze the current situation and development trend of vapor chamber technology and to construct a comprehensive framework system by elaborating its structure, working principle, and heat transfer efficiency. In particular, the calculation method of thermal resistance, as a core indicator of the heat dissipation efficiency of a vapor chamber, is crucial for achieving high heat dissipation efficiency. To comprehensively understand and improve the thermal resistance performance of the vapor chamber, this study provides a systematic review of the factors affecting thermal resistance performance. These factors can be broadly categorized into two main groups. The first is the composition of the vapor chamber, which mainly includes the wick, envelope material, and working medium. Among them, the wick, as a key structure affecting the thermal resistance, the current research status of its type and performance will be the focus of analysis in this paper, and the external environmental conditions during the work of the vapor chamber, such as the heat source characteristics, inclination angle, cooling conditions, etc. Changes in these external factors have a significant impact on the thermal resistance of the plate; therefore, their research is indispensable. Finally, based on the structural characteristics of the vapor chamber and the current technological development trends, future development directions are discussed.