掺硼金刚石薄膜表面高分散镍纳米颗粒的制备

Preparation of Highly Dispersed Nickel Nanoparticles on the Surface of Boron-Doped Diamond Films

摘要:

化学气相沉积制备掺硼金刚石薄膜因具有电化学势窗口宽、化学稳定性高和抗污能力强等特征，在电化学领域中有广阔的应用前景。用高分散金属纳米颗粒对掺硼金刚石（BDD）薄膜进行表面修饰，可显著提高其比表面积和活性位点，提升掺硼金刚石薄膜的电化学性能。采用混合酸对掺硼金刚石薄膜进行表面改性，获得亲水性表面，继而生长镍金属框架材料（Ni-MOFs），热处理后获得镍纳米颗粒。借助接触角测定仪对薄膜表面终端进行分析，并通过扫描电子显微镜对纳米镍颗粒修饰的BDD薄膜进行表征。结果表明：BDD表面从以氢端基为主的H-BDD转变为以氧基团为主的O-BDD表面，接触角由70 °减小为33.7 °；纳米镍颗粒分散均匀，粒径大小为5—12 nm，颗粒密度约为3.5×10⁶ cm^-2。

Abstract:

Boron-doped diamond films prepared by chemical vapor deposition have broad application prospects in the field of electrochemistry because of their wide electrochemical potential window， high chemical stability， and strong anti-fouling ability. Using highly dispersed metal nanoparticles to modify the surface of the boron-doped diamond film can significantly increase its specific surface area and active sites， and improve the electrochemical performance of the boron-doped diamond film. In this paper， boron-doped diamond films were modified by mixing acid and hydrophilic surfaces were obtained. Then nickel metal frame materials （Ni-MOFs） were grown， and nickel nanoparticles were formed after heat treatment. The surface terminals of BDD films were analyzed with the help of a contact angle measuring instrument， and the BDD films modified with nano-nickel particles were characterized by scanning electron microscopy. The results showed that the BDD surface changed from H-BDD dominated by the hydrogen terminal group to O-BDD dominated by the oxygen group， and the contact angle decreased from 70 ° to 33.7 °. The nano-nickel particles were evenly dispersed with particles size of 5-12 nm and the nanoparticle density was about 3.5×10⁶ cm^-2.