大尺寸ITO靶材的制备及其密度影响因素的研究

Preparation of Large Size ITO Targets and Influencing Factors of Target Density

摘要:

为制备大尺寸高密度ITO靶材，采用冷等静压及常压高温烧结的方法，制备了尺寸为1500 mm的ITO靶材，同时研究了ITO粉末的松装密度、冷等静压压力、烧结温度和保温时间等因素对靶材密度的影响。结果表明：当ITO粉末松装密度较大及粉体颗粒较小时，所制备的靶材相对密度更高；在冷等静压压力300 MPa、烧结温度1580 ℃、保温时间20 h的条件下，制备靶材的相对密度可达99.71%。表明上述工艺可以实现尺寸为1500 mm的大尺寸ITO靶材的制备，并且靶材相对密度较高。

Abstract:

Cold isostatic pressing （CIP） and high temperature pressless sintering were used to prepare large size （1500 mm） and high density ITO targets. The effect on the density of ITO targets were investigated with the consideration of factors such as the apparent density of ITO powder， the pressure of CIP， sintering temperature and holding time. The results show that when the ITO powder has a higher apparent density and smaller particle size， the prepared target has a higher relative density. The relative density of the target can reach as high as 99.71% at conditions of CIP pressure above 300 MPa， sintering temperature 1580 ℃ and holding time 20 h. Overall， the results show using the above process large size ITO target （1500 mm） can be prepared with a high relative density.