氧化物靶材的制备及研究进展

Research Progress of Preparation and Application of Oxide Targets

摘要:

氧化物靶材是一种关键性镀膜基材，主要用于磁控溅射制备TFT薄膜，并将其应用于晶体管等器件中透明电极、半导体沟道层，同时也广泛应用于显示面板领域。为满足高性能器件对薄膜的要求，氧化物靶材逐渐向高致密、大尺寸、异形化方向发展。以显示行业中氧化物靶材作为重点，介绍了氧化物靶材制备流程，主要从素坯成型、烧结工艺两个角度对氧化物靶材进行总结，分析了烧结工艺对靶材参数与溅射薄膜电阻率、光学透射率及粗糙度等方面的影响，最后阐述了国内外氧化物靶材市场的现状及发展趋势。

Abstract:

Oxide targets， as key coating materials， are mainly used to prepare transparent electrode and semiconductor channel layer of TFT thin film transistor by magnetron sputtering and widely applied in the field of display panel. Targets with high density， large size and abnormity are needed for excellent film. Focusing on oxide targets in the display field， this paper introduces their forming and sintering process， and analyses the influence of sintering process on targets parameters and resistivity， optical transmittance， roughness of film. Finally， the research status and progress of oxide targets are summarized and prospected.