辉光放电发射光谱高分辨率深度谱的定量分析

Quantification of high-resolution depth spectrum of glow discharge emission spectrometry

摘要:

介绍了辉光放电发射光谱仪（GDOES）的发展和应用领域，以及测量深度谱定量分析的MRI模型．主要对单晶硅表面自然氧化的SiO2层、单层硫脲分子和Mo/B4C/Si多层光学膜进行了GDOES高分辨率深度谱的定量分析，由此获得了膜层结构、界面粗糙度及元素溅射速率等定量信息．同时，对Mo/Si多层膜GDOES与SMIS深度分辨率进行了比较，最后展望了GDOES和MRI模型的发展趋势．

Abstract:

The development and application of glow discharge emission spectrometry （GDOES）， and the MRI model for quantitative sputter depth profiling are introduced. The measured high-resolution GDOES depth profiles of SiO2 layer naturally grown on the substrates， single thiourea molecular layer and optical multilayer of Mo/B4C/Si are quantitatively evaluated. The layered structure， interface roughness and sputtering rate are obtained accordingly. Meanwhile， the depth resolution values of the GDOES and SMIS depth profiles of Mo/Si multilayers are compared. Finally， the future development of GDOES and the MRI model are prospected.